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CROSSWORD
ANSWER

spluttering

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The answer SPLUTTERING has 1 possible clue(s) in existing crosswords.

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The word SPLUTTERING is VALID in some board games. Check SPLUTTERING in word games in Scrabble, Words With Friends, see scores, anagrams etc.

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Definitions of spluttering in various dictionaries:

verb - utter with a spitting sound, as if in a rage

verb - spit up in an explosive manner

verb - to speak rapidly and confusedly

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Possible Crossword Clues
Spitting explosively

Last Seen in these Crosswords & Puzzles
May 27 2014 The Times - Concise

Spluttering might refer to
Sputtering is a process whereby particles are ejected from a solid target material due to bombardment of the target by energetic particles, particularly gas ions in a laboratory. It only happens when the kinetic energy of the incoming particles is much higher than conventional thermal energies (≫ 1 eV). This process can lead, during prolonged ion or plasma bombardment of a material, to significant erosion of materials, and can thus be harmful. On the other hand, it is commonly used for thin-film deposition, etching and analytical techniques. Sputtering is done either using DC voltage (DC sputtering) or using AC voltage (RF sputtering). In DC sputtering, voltage is set from 3-5 kV and in RF sputtering, power supply is set at 14 MHz. Due to the application of an alternating current, the ions inside the plasma oscillate resulting in an increase in the levels of plasma.

Spluttering might refer to

Sputtering is a process whereby particles are ejected from a solid target material due to bombardment of the target by energetic particles, particularly gas ions in a laboratory. It only happens when the kinetic energy of the incoming particles is much higher than conventional thermal energies (≫ 1 eV). This process can lead, during prolonged ion or plasma bombardment of a material, to significant erosion of materials, and can thus be harmful. On the other hand, it is commonly used for thin-film deposition, etching and analytical techniques. Sputtering is done either using DC voltage (DC sputtering) or using AC voltage (RF sputtering). In DC sputtering, voltage is set from 3-5 kV and in RF sputtering, power supply is set at 14 MHz. Due to the application of an alternating current, the ions inside the plasma oscillate resulting in an increase in the levels of plasma.

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